Application:Hexafluoroethane is used as a versatile etchant in semiconductor
manufacturing. It can be used for selective etching of metal
silicides and oxides versus their metal substrates and also for
etching of silicon dioxide over silicon. The solar panel
manufacturing industry is one of the major emitters of
hexafluoroethane, which has a greenhouse gas potential 12,000 times
greater than CO2.
Together with trifluoromethane it is used in refrigerants R508A
(61%) and R508B (54%).
Impurity content (ppm)
O2≤0.5, N2≤0.5, CO ≤0.1, CO2≤0.1, Acidity≤0.003, Moisture≤0.1, Other Organics≤0.01
0.628931 ft3/lbs at 70oF
@70oF (21.1oC) = 445 psia (3068 kPa)
Liquid Density at Boiling Point
Gas Density at 70oF. 1 atm
Solubility In Water
Very slightly soluble
Specific Gravity (Air=1)
@70oF (21.1oC) = 4.78
Appearance And OdorColorless, odorless gas.